High aspect ratio surface relief structures by photoembossing
نویسندگان
چکیده
منابع مشابه
Manufacturing of Surface Relief Structures in Moving Substrates Using Photoembossing and Pulsed- Interference Holography
Photoembossing is a cost-effective technique for the production of complex surface relief structures in a photopolymer film, achieved via contact-mask exposure to UVlight. Here, photoembossing is explored using interference holography with a CWlaser and a nanosecond pulsed laser. It is shown that identical surface relief structures are produced if the photopolymer film is kept in a fixed positi...
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ژورنال
عنوان ژورنال: Applied Physics Letters
سال: 2007
ISSN: 0003-6951,1077-3118
DOI: 10.1063/1.2799744